Mostrar parámetros
- Talla
- 614 x 1024
- Pasos de muestreo
- 12
- Método de muestreo
- Euler a
- Escala CFG
- 3.5
- Excluir de la imagen
- lowres, bad quality, worst quality, bad anatomy, sketch, jpeg artifacts, ugly, poorly drawn, blurry, transparent background, censored, (simple background:1.4), artist name, signature, watermark, nsfw
Modelo y LoRA utilizados
![[Concept] Double exposure / environment inside the silhouette - AI Model cover image](https://images-ng.pixai.art/images/thumb/796a9e2a-e1e5-4364-9904-53d04da5f077)
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