Parameter anzeigen
- Qualitäts-Tag
- high quality, year_2025, year_2024, ﹝Prompts﹞
- Größe
- 768 x 1280
- Sampling-Schritte
- 22
- Sampling-Methode
- Euler a
- CFG scale
- 4.5
- Negativ
- bad quality, low quality, worst quality, lowres, sfw, jpeg artifacts, scan artifacts, mosaic, cropped, error, fewer digits, bad reflection, bad composition, bad anatomy, bad hands, bad fingers, missing fingers, extra hands, extra legs, excess fingers, light particles, artist name, text, watermark, username, copyright name,simple skirt, fabric skirt , pleated skir
Gesichtskorrektur
Verwendetes Modell und LoRA
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